Page 42 - 《摩擦学学报》2020年第6期

第 6 期 黄静飞, 等: CMP加工后芯片三维形貌表征参数体系 725

[13] Wang Yongtao, Zhao Erjing, Shang Ruigang, et al. Influence of 8(4): 309–315]. doi: 10.3321/j.issn:1004-924X.2000.04.002.
polishing process on silicon wafer surface Haze value[J]. [22] Yin Xiong. Study on three-dimensional surface topography based on
Semiconductor Technology, 2017, 42(12): 918–922 (in Chinese) [王 white light interferometer[D]. Wuhan: Wuhan Institute of
永涛, 赵而敬, 尚锐刚, 等. 抛光工艺对硅片表面Haze值的影响[J]. Technology, 2018(in Chinese) [尹雄. 基于白光干涉仪三维表面形
半导体技术, 2017, 42(12): 918–922]. 貌研究[D]. 武汉: 武汉工程大学, 2018].
[14] Lou Youxin, Wang Jiyang, Zhang Huaijin, et al. Study on chemical [23] Patir N. A numerical procedure for random generation of rough
mechanical polishing of Cu single crystal wafer prepared by surfaces[J]. Wear, 1978, 47(2): 263–277. doi: 10.1016/0043-1648(78)
czochralski method[J]. Journal of Synthetic Crystals, 2011, 40(6): 90157-6.
1418–1422 (in Chinese) [娄有信, 王继扬, 张怀金, 等. 提拉法制备 [24] Fu G H, Chandra A. A model for wafer scale variation of material
铜单晶基片的化学机械抛光研究[J]. 人工晶体学报, 2011, 40(6):
removal rate in chemical mechanical polishing based on viscoelastic
1418–1422]. doi: 10.3969/j.issn.1000-985X.2011.06.012.
pad deformation[J]. Journal of Electronic Materials, 2002, 31(10):
[15] Yang Yumei, Yun Na. The influence of chemical mechanical
1066–1073. doi: 10.1007/s11664-002-0044-4.
polishing on wafer surface haze[J]. Equipment for Electronic
[25] Wu Yiwan, Ren Zhiying, Gao Chenghui, et al. Study on 3d surface
Products Manufacturing, 2015, 249(11): 21–24, 39 (in Chinese) [杨
parameter evaluation method of ultra precision optical lenses[J].
玉梅, 云娜. 化学机械抛光对硅片表面质量影响的研究[J]. 电子工
Acta Metrologica Sinica, 2017, 38(4): 410–415 (in Chinese) [吴乙
业专用设备, 2015, 249(11): 21–24, 39]. doi: 10.3969/j.issn.1004-
万, 任志英, 高诚辉, 等. 超精密光学镜片三维表面形貌参数评定
4507.2015.11.005.
方法研究[J]. 计量学报, 2017, 38(4): 410–415]. doi: 10.3969/j.issn.
[16] Zhang Shumin, Zhu Jingtao, Wang Fengli, et al. Combination of
1000-1158.2017.04.06.
surface characterization techniques for analyzing the roughness of
[26] Lin Jianxing. Surface characterization methods of super smooth
the substrate[J]. Optical Instruments, 2006, 28(4): 137–140
optical[D]. Fuzhou: Fuzhou University, 2014(in Chinese) [林建兴.
(in Chinese) [张淑敏, 朱京涛, 王风丽, 等. 极紫外多层膜基底表面
超光滑光学元件表面表征方法研究[D]. 福州: 福州大学, 2014].
粗糙度综合表征技术[J]. 光学仪器, 2006, 28(4): 137–140]. doi:
[27] Zuo Xue. Fractal characterization of worn surface topography and its
10.3969/j.issn.1005-5630.2006.04.028.
variation during wear process[D]. Xuzhou: China University of
[17] Zheng Wei. The slurry of chemical mechanical polishing and
Mining and Technology, 2017(in Chinese) [左雪. 磨损表面形貌的
planarization process[D]. Dalian: Dalian University of Technology,
分形表征及其随磨损过程的变化规律研究[D]. 徐州: 中国矿业大
2010(in Chinese) [郑炜. 极大规模集成电路铜化学机械抛光液及
学, 2017].
平坦化工艺的研究[D]. 大连: 大连理工大学, 2010].
[28] Li Xiaolong. Analysis and characterization of paper surface micro-
[18] Zhang J H, Zhen S X, Yang L J, et al. Super smooth modification of
topography[D]. Guangzhou: South China University of Technology,
Al 2 O 3 ceramic substrate by high temperature glaze of CaO-Al 2 O 3 -
2014(in Chinese) [李小龙. 纸张表面微观形貌的分析与表征研究
SiO 2 system[J]. Japanese Journal of Applied Physics, 2011, 50(1):
[D]. 广州: 华南理工大学, 2014].
015803.
[29] Ren Zhiying, Gao Chenghui, Lin Jianxing, et al. Application of
[19] Zhang Lei, Wang Haiqian, Suo Shixing, et al. Preparation of
composite evaluation method in assessment of three-dimensional
CeO 2 /ZrO 2 colloidal SiO 2 composite abrasive and its polishing
rough surface[J]. Acta Metrologica Sinica, 2014, 35(5): 414–419
behavior on sapphire[J]. Bulletin of The Chinese Ceramic Society,
(in Chinese) [任志英, 高诚辉, 林建兴, 等. 复合评定法在三维粗糙
2018, 37(9): 3021–3027 (in Chinese) [张雷, 王海倩, 所世兴, 等.
CeO 2 /ZrO 2 硅溶胶复合磨料的制备及其对蓝宝石抛光性能的影响 表面评定中的应用[J]. 计量学报, 2014, 35(5): 414–419]. doi:
[J]. 硅酸盐通报, 2018, 37(9): 3021–3027]. 10.3969/j.issn.1000-1158.2014.05.02.
[20] ISO 25178-2. Geometrical product specifications (GPS)-Surface [30] Wu J J. Characterization of fractal surfaces[J]. Wear, 2000, 239(1):
texture: Areal-Part 2: Terms, definitions and surface texture 36–47. doi: 10.1016/S0043-1648(99)00362-2.
parameters: International Organization for Standardization[S]. 2012. [31] Li Chenggui, Dong Shen. Counting methods of fractal dimension for
[21] Wang Fusheng, Tan Jiubin. Methods of high resolution optical 3D surface topography[J]. Aviation Precision Manufacturing
measurement for surface profile[J]. Optics and Precision Technology, 2000, 36(4): 36–40 (in Chinese) [李成贵, 董申. 三维
Engineering, 2000, 8(4): 309–315 (in Chinese) [王富生, 谭久彬. 表 表面形貌的分形维数计算方法[J]. 航空精密制造技术, 2000,
面微观轮廓的高分辨率光学测量方法[J]. 光学精密工程, 2000, 36(4): 36–40]. doi: 10.3969/j.issn.1003-5451.2000.04.009.