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王耀之等:基于     PIC-MCC  方法的溅射离子泵抽速计算方法                              411


              [3]   HARTWIG H,KOUPTSIDIS J S. A new approach for com-  [13]   NANBU K. Theory of cumulative small-angle collisions in
                 puting  diode  sputter-ion  pump  characteristics[J].  Journal  of  plasmas[J]. Physical Review E,1997,55(4):46−52.
                 Vacuum Science and Technology,1974,11(6):1154−1159.  [14]   NANBU  K.  Probability  theory  of  electron–molecule, ion–
              [4]   何炜,王仁康,耿天鹏,等. 溅射离子泵的抽速计算            [J]. 真      molecule,molecule–molecule,and coulomb collisions for par-
                 空科学与技术,1982(4):199−208.                            ticle modeling of materials processing plasmas and cases[J].
              [5]   宁久鑫,黄海龙,王晓冬,等. 溅射离子泵抽气单元放电及                     IEEE Transactions on Plasma Science,2000,28(3):971−
                 离子输运仿真      [J]. 东北大学学报(自然科学版),2020,               990.

                 41(7):962−967.                                 [15]   JEPSEN  R  L.  The  physics  of  sputter-ion  pumps[C]//Pro-
              [6]   HA T,CHUNG S,PARK C D. Optimization of cell geome-  ceedings of the 4th International Vacuum Congress,1968:
                 try for a conventional sputter ion pump by a particle-in-cell  317-324.
                 simulation[J]. Journal of Vacuum Science & Technology A  [16]   ROKHMANENKOV  A  S, KURATOV  S  E.  Numerical
                 Vacuum Surfaces and Films,2009,27(3):485−491.      simulation  of  penning  gas  discharge  in  2D/3D  setting[J].
              [7]   耿健,王晓冬,郭美如,等. 微型溅射离子泵的阳极筒长度                     Journal  of  Physics: Conference  Series, 2019, 1250(1):
                 对抽气特性的影响      [J]. 东北大学学报(自然科学版),2023,             12−36.
                 44(11):1596−1603.                              [17]   SCHUURMAN W. Investigation of a low pressure Penning
              [8]   KÜHN C,RODION G. picFoam:An OpenFOAM based elec-  discharge[J]. Physica,1967,36(1):136−160.
                                                                [18]   SIGMUND P. Theory of sputtering. I. Sputtering yield of
                 trostatic  Particle-in-Cell  solver[J].  Computer  Physics  Com-
                                                                    amorphous and polycrystalline targets[J]. Physical Review,
                 munications,2021,262(1):107853.
              [9]   耿健,郭美如,王晓冬,等. 微型溅射离子泵放电模拟与抽                     1969,184(2):383−416.
                 气特性研究    [J]. 真空与低温,2021,27(1):45−51.          [19]   SEAH M P,CLIFFORD C A,GREEN F M,et al. An accu-
                                                                    rate semi-empirical equation for sputtering yields I:For ar-
              [10]   TOMONOR T,ABE H. A binary collision model for plasma
                                                                    gon  ions[J].  Surface  and  Interface  Analysis, 2005, 37(5):
                  simulation with a particle code[J]. Journal of Computational
                                                                    444−458.
                  Physics,1977,25(3):190−205.
                                                                [20]   刘玉魁,杨建斌,肖祥正,等. 真空工程设计         [M]. 北京:化
              [11]   SONG,M Y,CHO H,KARWASZ G P,et al. Cross sec-
                                               *
                                                     +
                  tions for electron collisions with N 2 ,N 2 ,and N 2 [J]. Jour-  学工业出版社,2016.
                                                                [21]   田野. 溅射离子泵阴极板溅射过程的模拟分析           [D]. 沈阳:
                  nal of Physical and Chemical Reference Data,2023,52(2):
                                                                    东北大学,2019.
                  023104.
                                                                [22]   刘亦兵,张本义,秦明,等. LH-300 型冷阴极抽氢溅射离
              [12]   ISOARDI T,FERRETTI A,BONMASSAR L,et al. Mo-
                                                                    子泵的研制    [J]. 真空,1980(3):28−38.
                  deling and simulation of sputter-ion pump performances[J].
                  Vacuum,2023,209(3):111792.                                           (责任编辑:郭 云)


















              引文信息:王耀之,刘奕新,张华鹏,等. 基于               PIC-MCC  方法的溅射离子泵抽速计算方法[J]. 真空与低温,2025,31(3):
                      405−411.
                      WANG Y Z,LIU Y X,ZHANG H P,et al. Calculation method of sputtering ion pump pumping speed based on PIC-MCC
                      method[J]. Vacuum and Cryogenics,2025,31(3):405−411.
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