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45(3):199−207. [19] 张廷凯,甘志银,张鸿海. 两电极多层阳极键合实验研究 [J].
[12] TANAKA S J. Wafer level hermetic MEMS packaging by 传感器与微系统,2009,28(7):21−23.
anodic bonding and its reliability issues[J]. Microelectro- [20] 秦会峰,孟庆森,胡立芳. 玻璃/铝多层结构间阳极键合机
nics Reliability,2014(54):875−881. 理及界面微观分析 [J]. 兵器材料科学与工程,2014,
[13] LUO Z Y,CHEN D Y,WANG J B,et al. A high Q reso- 37(6):39−42.
nant pressure microsensor with through glass electrical in- [21] JOYCE R,SINGH K,VARGHESE S,et al. Stress reduc-
terconnections based on wafer level MEMS vacuum pack- tion in silicon/oxidized silicon–Pyrex glass anodic bonding
aging[J]. Sensors,2014(14):24244−24257. for MEMS device packaging:RF switches and pressure sen-
[14] WEICHEL S,REUS R D,BOUAIDAT S,et al. Low-tem-
sors[J]. Journal of Materials Science:Materials in Electro-
perature anodic bonding to silicon nitride[J]. Sensors & Ac-
nics,2015,26(1):411−423.
tuators A Physical,2000,82(1/3):249−253.
[22] 陶俊明,刘文超,郭等柱,等. 片上电子源的真空阳极键
[15] 郑雅欣,阮勇,祝连庆,等. 圆片级封装中的二次硅-玻璃
合 [J]. 真空电子技术,2024(4):28−33.
键合工艺研究 [J]. 传感器与微系统,2024,43(10):50−54.
[23] ALBAUGH K B,RASMUSSEN D H. Rate processes dur-
85
[16] SU J,DENG K,GUO D Z,et al. Stable Rb micro vapor
ing anodic bonding[J]. Journal of the American Ceramic
cells:fabrication based on anodic bonding and application
Society,1992,75(75):2644−2648.
in chip-scale atomic clocks[J]. Chinese Physics B, 2010,
[24] 陈大明,胡利方,时方荣,等. 硅-玻璃-硅阳极键合机理及
19(11):110701.
力学性能 [J]. 焊接学报,2019,40(2):123−127.
[17] 杜婷,李兴辉,韩攀阳,等. 高气密性碱金属微气室低温阳
[25] VISSER M M,PLAZA J A,WANG D T,et al. Chemical
极键合技术研究 [J]. 传感器与微系统,2020,39(11):
analysis of bonded and debonded silicon-glass interfaces[J].
14−17.
Journal of Micromechanics and Microengineering, 2001,
[18] WALLIS G, POMERANTZ I. Filed assisted glass-metal
11(5):1−6.
sealing[J]. Journal of Applied Physic,1969,40(10):3946−
3949. (责任编辑:郭 云)
引文信息:仲子琪,杜婷,李兴辉,等. 芯片级原子束钟真空腔技术研究[J]. 真空与低温,2025,31(3):412−418.
ZHONG Z Q,DU T,LI X H,et al. Research on vacuum chamber of chip-scale atomic beam clocks[J]. Vacuum and Cryo-
genics,2025,31(3):412−418.