Page 47 - 《真空与低温》2026年第1期

真空与低温 第 32 卷 第 1 期
44 Vacuum and Cryogenics 2026 年 1 月

面 向 离 子 束 抛 光 的 聚 焦 型 射 频 离 子 源 研 制

袁祖浩，王建青，成东明，王佳方，李 明，李 勇
（中国电子科技集团公司第四十八研究所，长沙 410000）

摘要：根据高精度光学制造的需求，成功研制出聚焦型射频离子源，突破了国内相关技术瓶颈。通过电磁场
仿真优化线圈结构与磁场配置，采用 5 匝线圈与 12 根铝镍钴磁棒组成的环形永磁组件，显著提升等离子体密度与
均匀性。基于分层架构与 MVVM 模式开发的控制系统，集成四大功能模块，实现工艺过程的稳定闭环控制。实
验结果表明：离子源束径均值为 8.37 mm，满足≤Φ10 mm 设计要求；8 h 连续运行中体积去除率波动仅为 0.33%，
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远优于≤5% 的指标要求，平均体积去除率达 9.40×10 mm /min，显著超过基准值。在高真空环境下，系统能稳定
制备重复性良好的去除函数斑点，充分验证了其优异的长时运行稳定性与加工一致性。研究结果为高精度、高效
率光学元件加工提供了可靠技术支撑，具有重要工程应用价值。
关键词：离子束；射频离子源；仿真
中图分类号：TB71 文献标志码：A 文章编号：1006-7086（2026）01-0044-07
DOI：10.12446/j.issn.1006-7086.2026.01.006

Development of a Focused RF Ion Source for Ion Beam Figuring

YUAN Zuhao，WANG Jianqing，CHENG Dongming，WANG Jiafang，LI Ming，LI Yong
（The 48th Research Institute of China Electronics Technology Group Corporation，Changsha 410000，China）

Abstract：To address the critical requirements of high-precision optical manufacturing，a focused Radio-frequency（RF）
ion source has been successfully developed， overcoming significant domestic technological barriers in this advanced field.
Leveraging detailed electromagnetic field simulations，the coil structure and magnetic field configuration were meticulously
optimized. This led to the adoption of an annular permanent magnet assembly consisting of 12 Alnico (Aluminum-Nickel-
Cobalt) magnetic rods in conjunction with the 5-turn coils. This innovative design substantially enhances both the plasma
density and its distribution uniformity，establishing a stable and controllable foundation for precise material removal essential
in ultra-precision optics fabrication. In parallel，a dedicated control system was developed based on a layered software archi-
tecture and the Model-View-ViewModel（MVVM） design pattern. This system integrates four core functional mod-
ules —real-time process monitoring， parameter configuration， fault diagnosis， and data management which enables stable
closed-loop control over the entire ion beam figuring process. This intelligent control framework ensures high repeatability，
operational stability，and minimizes human intervention，which is crucial for achieving consistent machining outcomes. Com-
prehensive experimental validation confirms the system's outstanding performance. The average ion beam diameter measures
8.37 mm，fully complying with the ≤Φ10 mm design specification. During an extended 8-hour continuous operation test，the
system demonstrated remarkable stability，with the fluctuation in volume removal rate recorded at a mere 0.33%，far surpass-
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ing the ≤5% performance benchmark. Moreover，the average volume removal rate achieved 9.40×10 mm /min，significant-
ly higher than the preset baseline value. Under high-vacuum conditions，the system consistently generated well-defined and
highly repeatable removal function spots. These results robustly demonstrate its excellent long-term operational stability and
superior machining consistency.In summary，this research provides a robust and reliable technical foundation for high-preci-
sion，high-efficiency optical component processing. The successful development of the focused RF ion source，together with
the advanced control system，represents a substantial step forward in deterministic optical fabrication technology. The out-
comes hold considerable engineering application value， offering a viable and promising solution for the manufacturing of
next-generation high-performance optical systems，such as those used in aerospace，astronomy，and advanced lithography.
Key words：ion beam；RF ion source；simulation

收稿日期：2025−11−29
基金项目：国防基础科研计划（JCKY2023210C020）
作者简介：袁祖浩，硕士，工程师。E-mail：yuanzuhao@126.com